Chromium Tube Target Pure>3N5 127*458*10 Chromium Sputtering Target
| Item name | Chromium plate target |
| Size | 127*458*10 |
| Pure | Pure>3N5 |
| Packaging | Vacuum package in wooden case |
| Port of place | Xi'an port, Beijing port, Shanghai port, Guangzhou port, Shenzhen port |
Chromium (Chromium), chemical symbol Cr, atomic number 24, in the periodic table belongs to group ⅵ B. The element name comes from the Greek word for "color," because chromium compounds are colored. Steel gray metal is the hardest metal in nature. Chromium, at 0.01% in the earth's crust, ranks 17th. Free natural chromium is extremely rare and occurs mainly in chromium-lead ore. In the metallurgical industry, chromite is mainly used to produce ferrochrome alloy and chromium metal. Ferrochrome alloy as steel additive production of a variety of high strength, corrosion resistance, wear resistance, high temperature resistance, oxidation resistance of special steel, such as stainless steel, acid resistant steel, heat resistant steel, ball bearing steel, spring steel, tool steel, etc.. Metal chromium is mainly used for smelting special alloys with cobalt, nickel, tungsten and other elements. These special steels and special alloys are indispensable materials for aviation, aerospace, automobile, shipbuilding, as well as the production of guns, missiles, rockets, ships and other national defense industries. In refractories, chromite is used to make chrome bricks, chrome magnesia bricks and other special refractories.
Other product
| titanium sputtering targets |
| Chromium Sputtering Target |
| Chromium Plate Target |
| Plate Targets |
| cr sputtering target |
| Zirconium Target |
| Zirconium targets |
The coating target is a sputtering source that forms various functional films on the substrate by magnetron sputtering, multi-arc ion plating or other types of coating systems under appropriate technological conditions. To put it simply, the target material is the target material of high-speed charged particles bombardment. When used in high-energy laser weapons, different power densities, different output waveforms and different wavelengths of laser interact with different targets, different killing and destruction effects will be produced. Among all the application industries, the semiconductor industry has the most stringent quality requirements for target sputtering films. Today, 12-inch (300 epistaxis) silicon chips have been made. The magneto-optical disc made with it has the characteristics of large storage capacity, long service life and repeated non-contact erasable writing.
Features
1. Low density and high strength
2. Customized according to the drawings required by customers
3. Strong corrosion resistance
4. Strong heat resistance
5. Low temperature resistance
6. Heat resistance
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3N5 127*458*10mm Chromium Sputtering Target Plate Shape Images
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